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Standard

NEK IEC 63068-1:2019

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Abstract

IEC 63068-1:2019(E) gives a classification of defects in as-grown 4H-SiC (Silicon Carbide) epitaxial layers. The defects are classified on the basis of their crystallographic structures and recognized by non-destructive detection methods including bright-field OM (optical microscopy), PL (photoluminescence), and XRT (X-ray topography) images.  

Document information

  • Standard from NEK
  • Published:
  • Edition: 1.0
  • Version: 1
  • Document type: NAT
  • ICS 31.080.99
  • National Committee NEK/NK47

Product Relations

  • Adopted from: IEC 63068-1:2019