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Standard

NEK EN 62047-16:2015

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Abstract

IEC 62047-16:2015 specifies the test methods to measure the residual stresses of films with thickness in the range of 0,01 μ to 10 μ in MEMS structures fabricated by wafer curvature or cantilever beam deflection methods.

Document information

  • Standard from NEK
  • Published:
  • Edition: 1
  • Version: 1
  • Document type: NAT
  • ICS 31.080.99
  • National Committee NEK/NK47

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  • Adopted from: EN 62047-16:2015 , 0