Standard

NEK IEC 62047-2:2006

Aug 2006 Published

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Language English

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Abstract

Specifies the method for tensile testing of thin film materials with length and width under 1 mm and thickness under 10 m, which are main structural materials for micro-electromechanical systems (MEMS), micromachines and similar devices. The main structural materials for MEMS, micromachines and similar devices have special features such as typical dimensions in the order of a few microns, a material fabrication by deposition, and a test piece fabrication by non-mechanical machining using etching and photolithography. This International Standard specifies the testing method, which enables a guarantee of accuracy corresponding to the special features.

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Standard from NEK
Published: 15 August 2006
Edition: 1.0
Version: 1
Document type: NAT
ISBN:

ICS 31.080.99
National Committee TC 47/SC 47F

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Adopted from: IEC 62047-2:2006

NEK IEC 62047-2:2006

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Abstract

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Abstract

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